photo maskblanks

Photo masks are one of the essential components in photolithography. The unstructured base plates are called mask blanks. For the later use, the substrate material and the reflective metal of the mask blanks must have excellent optical properties. g-materials offers mask blanks of a large number of combinations of substrate materials and metallization in sizes from 2" to 7". Additionally, we deliver the mask blanks ready for use in a mask-writer with a photoresist coating of your choice.

 

Substrates:

  • Soda Lime SL
  • Borosilicate BS
  • White Crown WC
  • Quartz QZ

Sizes:

  • Squares 2" up to 7"

Metallisation:

  • Chrome
  • Aluminium

Photoresist:

  • AZ 1500
  • 895i
  • All widely used positve and negative optical and e-beam resists are available

 

Photo Mask